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A new, simplified method for preparing model surfaces of cellulose is introduced. Non-polar cellulose derivative trimethylsilyl cellulose (TMSC) was deposited onto untreated silicon substrate by spin coating, after which the coated TMSC was regenerated back to cellulose by vapour phase acid hydrolysis. By optimising the parameters of spin coating, a smooth cellulose film of ca 20 nm was obtained with...
A method for preparing open, sub-monolayer cellulose films on a silicon substrate is introduced, and the open films were quantified using the three-dimensional information from atomic force microscopy (AFM) height images. The preparation method is based on spin coating low concentrations of trimethylsilyl cellulose (TMSC) on silicon and hydrolysing the TMSC to cellulose using a vapour phase acid hydrolysis...
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