Elektronika : konstrukcje, technologie, zastosowania > 2008 > Vol. 49, nr 1 > 41-42
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journal ISSN : | 0033-2089 |
journal e-ISSN : | 2449-9528 |
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[1] Schneider J. M., Rohde S. L., Sproul W. D., Matthews A.: Recent Developments in Plasma Assisted Physical Vapour Deposition. Journal of Physics D, vol. 33, 2000, p. 173.
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[2] Byung-Hwan Jeong, Jun-Seok Cho, Hyung-Soo Mok, Gyu-Ha Choe: A novel pulse power supply for magnetron using high voltage capacitor embedded high frequency transformer. Proc. of Applied Power Electr. Conf., vol. 3, 2004, pp. 1819-1824.
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[3] Rossnagel S. M., Hopwood J.: Magnetron sputter deposition with high levels of metal ionization. Appl. Phys. Lett. 63 (1993) 3285.