Elektronika : konstrukcje, technologie, zastosowania > 2012 > Vol. 53, nr 11 > 89-94
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journal ISSN : | 0033-2089 |
journal e-ISSN : | 2449-9528 |
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[1] Kouznetsov V., K. Macak, J. M. Schneider, U. Helmersson, I. Petrov: A novel pulsed magnetron sputter technique utilizing very high target power densities, Surface and Coatings Technology, 122, (1999), s. 290-293.
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[2] A. P. Ehiasarian, R. New, W. D. Munz, L. Hultman, U. Helmersson, V. Kouznetsov: Influence of high power densities on the composition of pulsed magnetron plasmas, Vacuum 65, (2002), s. 147-154.
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[3] Bohlmark J., J. Alami, Ch. Christou, A. P. Ehiasarian, U. Helmersson: Ionization of sputtered metals in high power pulsed magnetron sputtering, J. Vac. Sci. Technol. A 23(1), Jan/Feb 2005, s. 18-22.