Opto-Electronics Review > 2005 > Vol. 13, No. 1 > 31--34
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journal ISSN : | 1230-3402 |
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Bibliography
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1. M. Bruel, “A new silicon on insulator material technology”, Electron. Lett. 31, 1201–1202 (1995).
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2. A. Agarwal, T.E. Haynes, V.C. Venezia, O.W. Holland, and D.J. Eagleshman, “Efficient production of silicon-on-insulator films by co-implantation of He+ with H+”, Appl. Phys. Lett. 72, 1086–1088 (1998).
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3. A. Misiuk, J. Bąk-Misiuk, M. Kaniewska, K.S. Zhuravlev, V. Raineri, and I.V. Antonova, “Nanostructured layers in high temperature-pressure treated silicon implanted with hydrogen/helium”, Mater. Phys. Mech. 5, 31–38 (2002).