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The n‐type and p‐type a‐GaN films are successfully grown by MOCVD on the r‐sapphire substrate with smooth mirror surface morphology. The growth rate versus the growth temperature is investigated. Optimum doping parameters by acceptor and donor impurities − 8 × 1017 and 4 × 1018 cm−3 are determined. Low‐temperature amorphous buffer (nucleus) GaN layer and the island growth process with additional...