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A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers...
A methodology combining non-destructive X-ray techniques is proposed to study the interfacial zones of periodic multilayers. The used X-ray techniques are X-ray emission spectroscopy induced by electrons and X-ray reflectivity in the hard and soft X-ray ranges. The first technique evidences the presence of compounds at the interfaces and gives an estimation of the thickness of the interfacial zone...
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