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A new high voltage AlGaN/GaN heterojuction field effect transistor (HFET) employing low taper angle field-plate (LTA-FP) has been proposed and verified experimentally to achieve stable forward blocking capability with low leakage current. Proposed device with a LTA-FP of 10 degrees, fabricated by adopting a new taper etching process, exhibits stable forward blocking capability with low leakage current...
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