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This paper addresses two challenges in humidity-controlled solvent annealing of poly(ethylene oxide)-b-polystyrene thin films: (1) reduction in annealing time by nearly an order of magnitude for toluene under high humidity, which is achieved by decreasing the annealing chamber volume; (2) utilization of two industry-benign solvents, methyl ethyl ketone (MEK) and propylene glycol monomethyl ether acetate...
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