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A novel enhanced electric-field impact-ionization MOS (E2I-MOS) is proposed, which achieves a subthreshold swing of as low as 6 mV/dec at room temperature while reducing the breakdown voltage by about 1.8 V. The E2I-MOS exhibits ≥ 10 × lower off-state leakage compared to previously reported I-MOS structures, thus reducing the power consumption and also making the device more scalable. A very high...
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