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A bulk sample of semi-insulating CdTe:In was exposed to single pulses of 21.2-nm radiation of Ne-like zinc plasma-based laser and 46.9-nm radiation of Ne-like argon capillary discharge laser. Irreversible changes induced by pure XUV laser radiation are studied and compared with action of continuous 532-nm high-power laser and IR pulses at 1320 nm. Modified surface is analyzed by optical and atomic...
We show the laser damage resistance of ion beam sputtered Ta2O5/SiO2 for high energy lasers can be increased by 50% when the Ta2O5 in the top few layers of the stack is replaced by HfO2 or Y2O3.
We have demonstrated table-top generation of λ = 13.9 nm laser pulses with 7 µJ energy at 2.5 Hz repetition rate from nickel-like ions in a laser-created plasma that will enable new applications of coherent soft x-ray light on a table-top.
Extreme ultraviolet lithography (EUVL) has been selected to print a new generation of semiconductor chips at the 22 nm half-pitch node and beyond. This technology has been demonstrated at laboratory and beta-tool scales but several technological issues, including the fabrication of defect-free masks, need to be addressed before it can be implemented for mass production of chips. In support of EUVL,...
We present results with different nanopatterning techniques using table top extreme ultraviolet lasers. The three approaches are interferometric lithography, Talbot self imaging and holographic projection lithography.
Phase-coherent soft x-ray laser pulses of 1.13 plusmn 0.47 ps duration were generated by injection-seeding a solid-target Ne-like Ti plasma amplifier with high harmonic pulses. This is the shortest pulse duration reported to date from a table-top soft x-ray laser amplifier.
We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 plusmn 3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.
We report the ablation of 200 nm-top wide (130 nm FWHM) trenches on PMMA photoresist by focusing the extreme ultraviolet output from a table-top capillary discharge laser with a Fresnel zone plate lens.
We have developed a numerical algorithm that, applied to extreme ultraviolet (EUV) micrographs, allows for the simultaneous determination of the spatial resolution and the size of the features of the image. The validity of the method was evaluated by analyzing EUV images.
A compact full-field photon-based microscope based on a desktop-size 46.9 nm wavelength extreme ultraviolet laser that captures images with a single nanosecond laser pulse and with a measured spatial resolution of 54 nm is described.
We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
We have conducted single photon ionization mass spectroscopy studies of the chemical reactivity of Sim/Tim/Hfm/Zrm/RumOn, metal oxide nanoclusters. The results are relevant to the carbon contamination of capping layers in extreme ultraviolet (EUV) reflective coatings.
Holographic images of carbon nanotubes 50–80 nm in diameter were obtained with a spatial resolution matching the wavelength of the compact capillary discharge extreme ultraviolet (EUV) laser used for illumination, 46.9 nm.
We use curvature correction and high-numerical-aperture imaging to demonstrate a soft-x-ray diffraction microscope with 70–90 nm resolution using two tabletop coherent sources. This near-diffraction-limited resolution of 1.5λ is a first for x-ray diffractive imaging.
We describe a correlation algorithm that allows for the simultaneous determination of object size and resolution in images of nanoscale objects. The method was used to analyze images recorded with a 13.2 nm laser.
We have conducted single photon ionization mass spectroscopy studies of the chemical reactivity of Sim/Tim/Hfm/Zrm/RumOn, metal oxide nanoclusters. The results are relevant to the carbon contamination of capping layers in extreme ultraviolet (EUV) reflective coatings.
We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100nm feature size.
We report the first experimental study of plasmas created by photoionization of solid targets with focused soft X-ray laser light. The plasma properties are dominantly determined by material absorption, in agreement with model simulations.
We have realized the first demonstration of imaging in the extreme ultraviolet (EUV) with near-wavelength spatial resolution, 54 nm, using a uniquely compact full-field microscope that can produce images with a single one nanosecond exposure.
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