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A simple technique is demonstrated to fabricate horizontal, uniform, and hexagonally arranged Sinanowire arrays with controlled orientation and density at spatially well defined locations on a substrate based on an in situ hard‐mask pattern‐formation approach by microphase‐separated block‐copolymer thin films. The technique may have significant application in the manufacture of transistor circuitry...
Highly dense hexagonal ordered arrays of superparamagnetic iron oxides nanodots are fabricated by a simple and cost‐effective route. Spectroscopic, microscopic and magnetic measurements show that the nanodots have uniform size, shape and their placement mimics the original self‐assembled block copolymer pattern. The nanodots show good thermal stability and strong adherence to the substrate surface,...
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