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It has been theoretically predicted that 1.9% biaxial tensile strain can convert Ge [1], which is compatible with Si CMOS technology, into a direct band-gap semiconductor, making it a candidate material for light sources on Si [2, 3]. Combining the advantage of tensile strain with quantum dot (QD), we proposed that tensile-strained QD is a new route toward light emission from Ge [4]. In this work,...
It is theoretically predicted that biaxial tensile strain as much as 1.4% can make up the 136 meV gap between the Γ and L valley in Ge [1], thereby converting Ge from an indirect-bandgap semiconductor into a direct-bandgap one that can emit light efficiently covering the telecom band. The mobility of both carriers is dramatically increased simultaneously. Therefore, tensile-strained Ge has drawn large...
InAs/InGaAs dot-in-well (DWELL) structures have been investigated with the systematically varied InGaAs thickness. Both the strained buffer layer (SBL) below the dot layer and the strain-reducing layer (SRL) above the dot layer were found to be responsible for the redshift in photoluminescence (PL) emission of the InAs/InGaAs DWELL structure. A linear followed by a saturation behavior of the emission...
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