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We report the controlled hydrothermal growth of rutile TiO 2 nanorods on Si wafers by using an anatase TiO 2 nanodot film as an assisted growth layer. The anatase nanodot film was prepared on the wafer by phase-separation-induced self-assembly and subsequent heat-treatment at 500°C. The nanodots on the wafer were then subjected to hydrothermal treatment to induce the growth of rutile...
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