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Electric fields can be induced by electron irradiation of insulating thin film materials. In this work, the electric fields under a broad beam illumination in transmission electron microscopy (TEM) are analyzed for insulating samples. Some damage phenomena observed can be interpreted by the mechanism of damage by the induced electric field (DIEF). For broad-beam illumination in an ultra-thin specimen,...
Electron beam damage in a CaF 2 –Al 2 O 3 –SiO 2 glass is investigated using time-dependent Ca L 23 and O K-edge electron energy-loss spectroscopy. It appears that there is a threshold dose rate, below which the damage involving the formation of O defects may not be detected, at any total dose. This suggests that the threshold phenomenon of dose rate may result...
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