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Graphene‐based nanostructures are considered as promising alternatives to silicon‐based mesostructures in future electronic nanodevices. The lithographical patterning of graphene, which are essential steps in any form of microelectronic processing, present interesting challenges because of the atomic layer thickness of graphene. Mesoscopic devices based on graphene require high spatial resolution...
An optical microscope‐focused laser beam technique was employed to effectively microstructure uniform patterns on graphene oxide nanosheets in a fast and controlled manner.
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