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Atomic layer deposition of ferroelectric PbTiO3 (PTO) thin films and its component oxide films were attempted using the Pb(DMAMP)2 and Ti(Oi-Pr)4 or Ti(Ot-Bu)4, as the Pb-and Ti-precursors, respectively, and H2O as oxidant at a wafer temperature of 200 on Ir/IrO2/SiO2/Si substrate. The stoichiometric PTO thin films were grown by a proper control of the cycle ratio of the PbO and TiO2 cycles. The increase...
After an evaluation of Zr precursor, quaternary Pb(Zr,Ti)Ox [PZT] films were prepared by a combination of binary atomic layer deposition (ALD) processes. ZrOx films were deposited on Pt/TiOx/SiOx/Si substrates using liquid injection ALD. Zr(C11H19O2)4 [Zr(DPM)4] dissolved in ethylcyclohexane (ECH) with a concentration of 0.1 M and water were used as precursor and oxidant, respectively. According to...
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