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In this paper, we report on fabrication of 50 nm features by using a UV step and stamp imprint lithography method (UV SSIL), which is based on thermal SSIL using a flip chip bonder. The idea is to fabricate nanoscale patterns by pressing a small stamp, also called mould or template, into a low viscosity monomer which is then polymerized and thereby hardened (cured) by UV exposure. The mirror replicaof...
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