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We report wavelength selective device nonuniformity of 1 nm over a 200 mm SOI wafer using CMOS fabrication technology. We also report correlation between device density and nonuniformity.
We present the focused-ion-beam fabrication of slots in existing silicon waveguides and racetrack resonators. The etch process was conducted with iodine enhancement and an alumina hard mask. We demonstrate a propagation loss of 100 dB/cm for slot waveguides and a Q value of 850 for slot racetrack resonators with bend radius of 6 mum.
We present photonic wire waveguides and basic components in Silicon-on-Insulator (SOI). A large number of these compact SOI devices fit on a single chip. We describe possible applications in biochemical sensing and strain sensing.
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