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Titanium dioxide (TiO2) thin films were deposited by remote‐plasma atomic layer deposition (RPALD). The process window was determined in the range from 150 to 300 °C for atomic layer deposition of TiO2 thin film. The crystal structure and grain size of the TiO2 thin films deposited by RPALD was controlled via the variations of the deposition temperature and post‐deposition thermal annealing. The as‐deposited...
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