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We deposited NiO via atomic layer deposition on mesoporous SiO2 particles with diameters of several hundred micrometers and a mean mesopore size of ∼14 nm. NiO was deposited within the shell region of mesoporous SiO2 particles with a shell thickness of ∼11 mm. We annealed the as-prepared NiO/SiO2 at 450 and 600 °C, respectively. These two samples were used as catalysts for the uptake of toluene molecules...
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