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Highly conducting AZO/Cu/AZO tri-layer films were successfully deposited on glass substrates by RF magnetron sputtering of Al-doped ZnO (AZO) and ion-beam sputtering of Cu at room temperature. The microstructures of the AZO/Cu/AZO multilayer films were studied using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM) and atomic force microscope (AFM). X-Ray diffraction measurements...
Tin-doped indium oxide (ITO) films were deposited by RF magnetron sputtering on TiO 2 -coated glass substrates (the TiO 2 layer is usually called seed layer). The properties of ITO films prepared at a substrate temperature of 300°C on bare and TiO 2 -coated glass substrates have been analyzed by using X-ray diffraction, atomic force microscope, optical and electrical measurements...
Highly conducting tri-layer films consisting of a Cu layer sandwiched between Al-doped ZnO (AZO) layers (AZO/Cu/AZO) were prepared on glass substrates at room temperature by radio frequency (RF) magnetron sputtering of AZO and ion-beam sputtering of Cu. The tri-layer films have superior photoelectric properties compared with the bi-layer films (Cu/AZO, AZO/Cu) and single AZO films. The effect of AZO...
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