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The atomic layer deposition (ALD) of iron sulfide (FeSx) is reported for the first time. The deposition process employs bis(N,N′‐di‐tert‐butylacetamidinato)iron(II) and H2S as the reactants and produces fairly pure, smooth, and well‐crystallized FeSx thin films following an ideal self‐limiting ALD growth behavior. The FeSx films can be uniformly and conformally deposited into deep narrow trenches...
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