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Pulsed laser deposition (PLD) employing a pulsed Nd:YAG laser was used to grow thin films from a pre‐synthesized Cr2AlC MAX phase ablation target onto MgO(100), amorphous SiO2 and stainless steel substrates. The depositions were carried out for substrate temperatures from room temperature to 650 °C. For one set of samples, a 200 eV argon ion‐beam was directed towards the substrate during deposition,...
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