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The integration of TSVs and bonded structures is an important topic in 3D integration. In this study, fine Cu TSVs and various bonded structures, including Cu/Sn micro-bumps, Cu bond pads, and Cu alloy structures, are integrated and demonstrated. Electrical performances, morphology investigations, and reliability investigations of TSVs, bonded bumps/pads, and the integrated structures are studied...
This paper summarizes and reports systematical studies of Cu-based bonding technology for 3D IC applications. Hybrid Cu-oxide and Cu-polymer bonding designs and schemes are investigated. Electrical performances and reliability of Cu bond structures provide important guidelines for future 3D IC applications.
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