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Amorphous hydrogenated carbon–silicon (a-Si X C Y :H) films were produced by plasma-enhanced chemical vapor deposition (PECVD) in an audio-frequency (a.f.) three-electrode reactor using tetramethylsilane as a source compound. The negative amplitude of a.f. voltage, V (−) , measured on a small electrode, on which the films were deposited, with respect to the ground was the only...
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