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Reactive diffusion during isothermal annealing was examined in a Ti−Al−Si temary system. When a TiAl/TiSi2 reaction couple was annealed at 1373 K for 200 h, the product phase sequence was observed as TiAl/TiAl2/Ti2Al5/TiAl3/Ti5Si4/TiSi/TiSi2, in which the integrated diffusion coefficient of Ti2Al5 showed the lowest value. A Ti-rich Ti5Si3 phase appeared when an additional Ti flux was provided between...
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