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Deposition of allylamine (ALL) by plasma enhanced chemical vapor deposition has been optimized on silicon based models. Simultaneous energy recoil detection analysis and Rutherford backscattering spectra show that 100 W deposition is ideal in terms of polymerized film formation and H content while, lower or higher power induce reduced film retention or excessive cross linking, respectively. Surface...
Two series of iron thin films have been grown on Si(100) wafers by DC magnetron sputtering at well-controlled low substrate temperatures. One of them was covered by a gold capping layer to prevent oxidation. Exchange bias, which only appears in non-capped films, is attributed to the natural film oxidation and depends on the preparation temperature. X-ray absorption spectroscopy and atomic force microscopy...
Silicon nitride thin films have been prepared by RF reactive and non-reactive sputtering over several substrates. Five different working sputtering gasses have been selected to study its influence on the composition and properties of the obtained thin films (Ar, N 2 , Ar/N 2 (50%), N 2 /H 2 (5%), Ar/H 2 (5%)). Optical absorption spectroscopy characterization...
This paper reports the improvements achieved in the tribological performance of V 5at% Ti vanadium-based alloy ion implanted with nitrogen at low energy. Nitrogen ion implantation was carried out at 400 o C with a current density of 1mA/cm 2 and an accelerating voltage of 1.2kV. Nanoindentation tests showed hardness increases by a factor close to 3. Ball-on-disk tests showed a decrease...
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