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Crystallization behaviors of amorphous Ti–Ni thin films were investigated by means of in situ X-ray diffraction measurements within the temperature interval 420–450°C. The results showed that crystalline Ti–Ni thin films displayed (110) preferential orientation. Analysis of the crystallization kinetics yielded Avrami exponents in the range 2.0–2.4 and an activation energy of 358.1kJ/mol. A site-saturation...
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