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We have demonstrated a new composite thin film for encapsulation consisting of polydimethylsiloxane (PDMS) and graphene. Graphene is a kind of hydrophobic material, causing that moisture could hardly penetrate into the surface of graphene. Graphene is usually fabricated by the method of Chemical Vapor Deposition (CVD). The atomic distance of graphene is very small; thus the water vapor channel from...
In this paper, SiNx and SiOx films for OLED encapsulation were deposited by plasma-enhanced chemical vapor deposition (PECVD). The properties, including surface roughness, scratch adhesion between the films and substrates, water vapor permeation rate were investigated. The results showed that the root-mean-square (Rms) surface roughness of encapsulation film could be improved from 2.7 nm to 1.2 nm...
We have developed a new method to measure the water vapor transmission ratio (WVTR) for thin film encapsulation (TFE) of organic light emitting diodes (OLEDs). It is a nondestructive method to measure WVTR by investigating the change of photoluminescent spectra of organic material. This method can be realized easily by online test. By calibrating the evolution curve (the photoluminescent intensity...
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