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A cathodic-arc evaporation system with plasma-enhanced duct equipment was used to deposit TiZrN, TiZrCN, and TiZr/a-C coatings. Reactive gases (N2 and C2H2) activated by the Ti and Zr plasma in the evaporation process was used to deposit the TiZrCN and TiZr/a-C coatings with different C and nitrogen contents. The crystalline structures and bonding states of coatings were analyzed by X-ray diffraction...
Nitrogen-doped Cr–C:H/N films were synthesized by using a cathodic-arc activated deposition process. Chromium plasma with intensive ion energies catalyzes the decomposition of hydrocarbon gas (C 2 H 2 ), and results in the deposition of amorphous carbon films. Nitrogen was introduced to form nitrogen-containing Cr–C:H/N films, which contained a mixture of sp 2 and sp 3...
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