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This study investigates the effect of the adhesion and removal of particles such as silica (SiO2), tantalum (Ta) and polystyrene latex (PSL) from three different kinds of EUV (extreme ultra violet) mask surfaces, specifically silicon (Si), tantalum nitride (TaN), and ruthenium (Ru). The results show that inorganic particles such as silica and Ta deposited on Si surface are harder to remove from its...
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