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We have generated Ar plasma in dense plasma focus (DPF) of hypocycloidal pinch (HCP) for extreme ultraviolet (EUV) lithography and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5kV to the capacitor bank of 1.53uF, and Ar gas has been filled into a diode chamber. The EUV emission signal whose wavelength is about 6–16nm has been detected...
Summary form only given. The research fields of soft X-rays and extreme ultraviolet (EUV) were used in a wide variety of EUV lithography techniques for semiconductor chip manufacture and soft Xray microscopy. We have generated Ar plasma in dense plasma focus device with coaxial electrodes and investigated an emitted visible and EUV light for electro-optical plasma diagnostics. We have applied an input...
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