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Summary form only given. The research fields of soft X-rays and extreme ultraviolet (EUV) were used in a wide variety of EUV lithography techniques for semiconductor chip manufacture and soft Xray microscopy. We have generated Ar plasma in dense plasma focus device with coaxial electrodes and investigated an emitted visible and EUV light for electro-optical plasma diagnostics. We have applied an input...
Ignition of peripheral plasma was examined in low-pressure (100-mtorr) RF capacitive coupled plasma by means of kinetic and fluid models. Plasma density and potential profiles are presented to visualize peripheral-plasma ignition. A dielectric gap size is an important parameter for a dense and stable plasma source.
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