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Boron plasmas are widely used in various ion beam and plasma technologies, including semiconductor ion doping. Of interest is also its use for deposition of hard coatings and surface modification to enhance the performance and lifetime of machine parts and tools. The paper reports on the generation of boron-rich plasma in a short high-current pulsed vacuum arc with a lanthanum hexaboride cathode,...
The generation of highly charged metal ions in vacuum arc plasmas is of interest to plasma physicists because of the possibility to extract new data on the ionization in cathode spots. In practical terms, e.g., in metal ion sources, increasing the ion charge provides a proportional increase in ion energy at a given accelerating voltage. In the last two decades, various techniques have been used to...
During the last decade the high power impulse magnetron sputtering technique (HiPIMS) has been developed intensively. A self-sputtering mode can be realized using HiPIMS, for a limited number of materials used as a sputtering target, which is characterized by a fraction of target material ions in the discharge plasma at least more than a half. Pure boron is almost nonconductive and therefore conventionally...
It is well known that automatic control of any process implies continuous or infrequent monitoring process parameters. At the ore dressing mills and metallurgical plants, such parameters may include composition of feedstock, fluxes, reagents, intermediate products, final tailings and wastewater. Usually, this information is supplied by the automated analytical monitoring system (AAMS), in which the...
Repetitive pulses of voltage and current are applied in high-power impulse magnetron sputtering. The current pulse usually lags the applied voltage by a significant time, which, in some cases, can reach several tens of microseconds. The current time lag is generally highly reproducible and jitters less than 1% of the delay time. This work investigates the time lag experimentally and theoretically...
A compact high power microwave (HPM) source is reported. It generates short pulses by direct excitation of an antenna with a 300 kV Marx generator. Oil insulation is used to protect capacitor banks from breakdown, while discharge gaps are designed to work in air. The Marx generator risetime is less than 50 ns. The disk-cone antenna is also oil-insulated and operates in the self-breakdown regime. Radiated...
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