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The paper reports on a mass-charge spectrometry study of ion beams extracted from the plasma of a vacuum arc discharge with a compound lanthanum hexaboride cathode. The elemental composition of the ion beams was analyzed using a magnetic separator. The vacuum arc operated in repetitive pulsed mode with a current amplitude of 140 A, full width at the base of ∼350 μs, and frequency of 2 Hz. The ion-extracting...
Boron plasmas are widely used in various ion beam and plasma technologies, including semiconductor ion doping. Of interest is also its use for deposition of hard coatings and surface modification to enhance the performance and lifetime of machine parts and tools. The paper reports on the generation of boron-rich plasma in a short high-current pulsed vacuum arc with a lanthanum hexaboride cathode,...
During the last decade the high power impulse magnetron sputtering technique (HiPIMS) has been developed intensively. A self-sputtering mode can be realized using HiPIMS, for a limited number of materials used as a sputtering target, which is characterized by a fraction of target material ions in the discharge plasma at least more than a half. Pure boron is almost nonconductive and therefore conventionally...
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