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Summary form only given. Addressable microcavity plasma devices with three electrode, dielectric barrier designs have been fabricated in 20 times 20 or 50 times 50 device arrays in Si and characterized in Ne, Ne/Xe, and Ar/D2 gas mixtures. Each device comprises two metal electrode layers, a dielectric stack, and an inverted square pyramid microcavity having an emitting aperture of 50 times 50 mum2...
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