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A chelating resin, PS-AMP, was synthesized simply by the reaction of chloromethylated polystyrene with 2-aminomethylpyridine for selective copper removal from simulated nickel electrolyte. As to the sole metal solution, the equilibrium data could be described by the Langmuir model, and the maximum adsorption capacities for Cu(II) and Ni(II) were 1.53 and 0.50 mmol/g, respectively. The kinetic curves...
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