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It was found that the negative repetitive pulsed biasing of a substrate with respect to the adjacent plasma significantly reduce the MPs content on surface. The decrease of MPs on the negative potential substrate surface is caused by several different physical mechanisms. Up to 10% of macroparticles (MPs) can be repulsed from the plasma-substrate voltage drop after being negatively charged in plasma...
It was found that the negative repetitive pulsed biasing of a substrate with respect to the adjacent plasma significantly reduce the macroparticles (MPs) content on surface. The decrease of MPs on the negative potential substrate surface is caused by several different physical mechanisms. Up to 10% of macroparticles can be repulsed from the plasma-substrate voltage drop after being negatively charged...
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