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Tunnel field effect transistor (TFET) is a potential candidate to replace CMOS in deep‐submicron region due to its lower SS (subthreshold swing, <60 mV/decade) at room temperature. However, the conventional TFET suffers from low tunneling current and high ambipolar current. To overcome these two shortcomings, a new structure, known as Hetero‐dielectric gate TFET (HDG TFET), has been proposed in...
Power dissipation is a main attention for designing complementary metal oxide semiconductor Very Large Scale Integration (VLSI) circuits in deep sub‐micron technology. Constant field device scaling leads to high transistor density, reduction in power supply, lower threshold voltage, and reduction in oxide thickness. This gives rise to short channel effects and increases the leakage currents causing...
This paper discusses a comprehensive analytical study of electrical properties of single‐wall conventional carbon nanotube field‐effect transistor (CNTFET) devices of subthreshold swing (SS), transconductance (gm), and extension resistance. The analytical expressions for SS and gm have been derived based on channel modulated potential. In the study, it was observed that SS value of the CNTFET device...
In the present paper, compact analytical models for the threshold voltage, threshold voltage roll‐off and subthreshold swing of undoped symmetrical double‐gate MOSFET have been developed based on analytical solution of two‐dimensional Poisson's equation for potential distribution. The developed models include drain‐induced barrier lowering (DIBL) through the Vds‐dependent parameter. The calculated...
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