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Li3PO4-Li2SiO3 thin films were prepared on the surface of Al2O3 fine ceramic substrates by radio frequency (RF) magnetron sputtering. The thin films were treated at different annealing temperatures (400–800°C) and for various time (0.5h, 1h,1.5h, and 2h) to investigate the influence of annealing conditions on the ionic conductive properties. The as-deposited and annealed thin films were characterized...
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