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In this work, we explore the effects of the number of fins and fin structure on the device DC, dynamic behaviors, and random-dopant-induced characteristic fluctuations of multifin field effect transistor (FET) circuits. Multifin FETs with different fin aspect ratios [AR ≡ fin height (Hfin)/fin width (Wfin)] and a fixed channel volume are simulated in a three-dimensional device simulation and the simulation...
This work for the first time estimates the influences of the intrinsic parameter fluctuations consisting of metal gate workfunction fluctuation (WKF), process variation effect (PVE) and random dopant fluctuation (RDF) on 16-nm-gate planar metal-oxide-semiconductor field effect transistors (MOSFETs) and circuits. The WKF and RDF dominate the threshold voltage fluctuation; however, the WKF brings less...
Fin-type vertical channel field effect transistors (FETs) are promising alternatives for the sub-32-nm CMOS technologies. This work investigates the impact of fin number and structure on Vth degradation and transient behavior of devices and circuits. Vertical channel transistors with different fin aspect ratio (AR = the fin height / the effective fin width) are explored. The multi-fin FinFETs (AR...
Modeling of device variability is crucial for the accuracy of timing in circuits and systems, and the stability of high-frequency application. Unfortunately, due to the randomness of dopant position in device, the fluctuation of device gate capacitance is nonlinear and hard to be modeled in current compact models. Therefore, a large-scale statistically sound ldquoatomisticrdquo device/circuit coupled...
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