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Short term threshold instabilities may cause erratic behavior in analog circuits like comparators and analog-to-digital-converters. As conventional characterization procedures have not been appropriately sensitized to such issues, this kind of erratic behavior usually only occurs in products where it is very difficult to identify. Therefore, for example prior to the introduction of a new gate stack,...
Hot-carrier, inducing source-drain current (IDS) increase in high-voltage p-channel lateral DMOS (LDMOS) transistors, is investigated. At low gate voltage (VGS) and high drain voltage (VDS), electrons are injected into the gate oxide, creating negative fixed oxide charges and interface-states above the accumulation region and the channel towards the source side (Figure 1). The source drain current...
NBTI degradation and recovery have been investigated for 7 to 50nm oxides and compared to a thin 2.2nm nitrided oxide. A wide regime of stress fields 2.5MV/cm to 8MV/cm has been covered. NBTI effect for the nitrided oxide is larger than for non-nitrided oxides. The percentage of threshold shift DeltaVth which is "lost" during a long measurement delay - which is the quantity leading to curved...
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