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Ellipsometric scatterometry has gained wide industrial applications in semiconductor manufacturing after ten years of development. Among the various types of ellipsometers, Mueller matrix ellipsometer (MME) can provide all 16 elements of the 4 by 4 Mueller matrix, and consequently, MME-based scatterometry can acquire much more useful information about the sample and thereby can achieve better measurement...
Nanomanufacturing refers to the manufacturing of products with feature dimensions at the nanometer scale. This paper presents the fundamental concepts and key issues of computational lithography and computational metrology for nanomanufacturing. We demonstrate their potentials and challenges by providing several examples carried out in our research group. We believe and expect that they will play...
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