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Ni 6 Fe 94 films were deposited on SiO 2 /Si(100) substrates at room temperature by oblique target co-sputtering and then annealed in vacuum at 573 K, 673 K and 753 K for 1 h, respectively. The as-deposited and annealed films mainly have a body-centered cubic structure and a [110]-crystalline orientation in the film growth direction. The [110]-orientation of the film enhances...
Ni 48 Fe 12 Cr 40 (7nm)/Ni 80 Fe 20 (40nm) bilayer films and Ni 80 Fe 20 (40nm) monolayer films were deposited at ambient temperature on Si(100)/SiO 2 substrates by electron beam evaporation. The effect of annealing on the structure, composition, magnetization and magnetoresistance of the Ni 48 Fe 12 Cr 40 /Ni...
80nm-thick Ni 50 Fe 50 layers were sputter-deposited on glass substrates at 400°C and then Au layers were sputter-deposited on the Ni 50 Fe 50 layers. The Au/Ni 50 Fe 50 bilayer films were annealed in a vacuum of 5×10 −4 Pa from 250 to 450°C for 30min or 90min. The characteristics of the Au layers were studied by Auger electron spectroscopy,...
240nm-thick Ni 49 Fe 51 films were sputter deposited on SiO 2 /Si(100) substrates at room temperature and then annealed in vacuum at 300, 400 and 480°C for 1h, respectively. Structural, electrical and magnetic properties of the films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), four-point probe technique and a vibrating...
Au/Ni 80 Fe 20 and Au/Ni 30 Fe 70 bilayer films obtained by electron beam evaporation and sputtering were annealed in a vacuum of 5×10 −4 Pa from 100 to 350 °C for 15 and 30 min, respectively. Auger electron spectroscopy (AES) was used to analyze the composition inside the Au layers. X-ray diffraction (XRD) was used to analyze the structural characteristic of...
Au layers with thickness of about 110nm were sputter-deposited on unheated glass substrates coated with a Cr layer about 20nm thick. The chamber was evacuated to a pressure of 2Pa and then sputtering was carried out at Ar pressure of 4Pa. The Au/Cr bilayer films were annealed in a vacuum of 5x10 -4 Pa at 170 o C, 180 o C, 200 o C and 250 o C for from 5...
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