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Ni 6 Fe 94 films were deposited on SiO 2 /Si(100) substrates at room temperature by oblique target co-sputtering and then annealed in vacuum at 573 K, 673 K and 753 K for 1 h, respectively. The as-deposited and annealed films mainly have a body-centered cubic structure and a [110]-crystalline orientation in the film growth direction. The [110]-orientation of the film enhances...
240nm-thick Ni 49 Fe 51 films were sputter deposited on SiO 2 /Si(100) substrates at room temperature and then annealed in vacuum at 300, 400 and 480°C for 1h, respectively. Structural, electrical and magnetic properties of the films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), four-point probe technique and a vibrating...
Au layers with thickness of about 110nm were sputter-deposited on unheated glass substrates coated with a Cr layer about 20nm thick. The chamber was evacuated to a pressure of 2Pa and then sputtering was carried out at Ar pressure of 4Pa. The Au/Cr bilayer films were annealed in a vacuum of 5x10 -4 Pa at 170 o C, 180 o C, 200 o C and 250 o C for from 5...
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