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The growth of Ni films deposited on a reconstructed (√2x2√2)R45 o O/Cu(001) is examined. It is shown that deposition of Ni changes the surface symmetry to c(2x2) and that oxygen always floats on the film surface. No NiO is formed. Surface roughness decreases and the growth mode is closer to ideal layer-by-layer, as compared to that of Ni/Cu(001) indicating a surfactant activity of oxygen....
The surface of Si(111) exposed to NH 3 or NO is analyzed with scanning tunneling microscopy, low-energy electron diffraction (LEED), Auger electron spectroscopy, and transmission electron microscopy. Crystalline silicon nitride thin films are formed on Si(111) after nitridation at T>1075 K. Corresponding to the 8x8 LEED pattern, a 30.7-Åperiodic superstructure is observed. The film thickness...
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