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Grating couplers using CMOS poly-silicon gate layer are demonstrated, which can be integrated with electronic circuits without adding any additional process steps. Peak coupling efficiency of ∼40% and 3dB bandwidth of ∼60nm are obtained with low back reflection.
Waveguide grating couplers based on complementary metal-oxide-semiconductor (CMOS) poly-silicon gate layers are designed and fabricated. Sharing the same etching profile as that of the CMOS poly-silicon gate layer, the fabrication of the grating couplers is fully embedded in the CMOS process without adding any additional masks or process steps. Peak coupling efficiency of 40% and 3 dB bandwidth of...
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