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Electromigration (EM) in VLSI chips has become a major reliability issues in nanometer VLSI design. Traditional compact EM models cannot give accurate predictions about the stress evolution over all stress conditions for complicated multi-branch interconnect structures. In this paper, we try to mitigate this problem by performing finite difference method (FDM) for the EM effects in multi-branch interconnects...
A TDD-OFDMA framework is designed for broadband wireless access. The main features of our design are predefined MAP structure, scalable OFDMA system with frequency overlay and MIMO mode switching scheme. An extensive system level simulation study has been carried out in the practical channel conditions. Our results show that the average sector throughput can be improved by 25~50%, and the size of...
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