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RF-sputtered molybdenum (Mo) thin films have been deposited by varying operating pressure (0.88 to 2.66Pa at 100W) and RF power (50W to 125W at 1.33Pa). The variation in process parameters studied herein primarily alters the kinetic energy of the sputtered particle during the Mo deposition process. Microstructural properties of the resulting Mo thin films such as crystal structure, orientation, surface...
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