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This work proposes an advanced key-variable selecting method, the neural-network-based stepwise selection (NN-based SS) method, which can enhance the conjecture accuracy of the NN-based virtual metrology (VM) algorithms. Multi-regression-based (MR-based) SS method is widely applied in dealing with key-variable selecting problems despite that it may not guarantee finding the best model based on its...
In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic devices shrink increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for the critical stages of production processes. W2W APC requires the metrology values of each wafer; however, it will...
In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic device shrinks increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for critical stages. W2W APC needs to obtain the metrology value of each wafer; however, it will be highly time and...
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